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TEM
SESAM JEOL ARM 1250 KV JEOL 4000FX Philips CM200
HRTEM
(Scherzer resolution)		 0.24 nm 0.12 nm 0.2 nm 0.27 nm
X-ray analysis
(spatial resolution)		 1 nm – >20 nm –
EELS analysis
spatial resolution
energy resolution		 parallel
>0.5 nm
0.1–0.2 eV		 parallel
>20 nm
≥1 eV		 – –
Maximal tilt angle 30°/15° 45°/45° 30°/15° 60°/30°
Heating stage
(max. temperature)		 900 °C 900 °C 900 °C –
Cooling stage –160 °C –160 °C –160 °C –160 °C
Deformation stage – – – –
Energy-filtering TEM yes yes – yes
Z-contrast yes – – –
Orientation measurements
by Kikuchi patterns		 – – – –
Energy-filtered diffraction yes
large angle		 – – yes

TEM (continued)
ZEISS 912 Omega VG HB 501UX
HRTEM
(Scherzer resolution)		 – –
X-ray analysis
(spatial resolution)		 >20 nm 1 nm
EELS analysis
spatial resolution
energy resolution		 parallel
>20 nm
0.9 eV		 parallel
>0.5 nm
0.3–0.7 eV
Maximal tilt angle 60°/30° 10°/10°
Heating stage
(max. temperature)		 900 °C –
Cooling stage –160 °C –
Deformation stage – –
Energy-filtering TEM yes –
Z-contrast – yes
Orientation measurements by Kikuchi patterns yes –
Energy-filtered diffraction yes
limited angle		 –

SEM
LEO 438VP JSM 6300F JEM 6400 EPMA
Cameca SX 100
Resolution 5 nm 3 nm 5 nm 6 nm
Tilt angle 90° 15° (15°) –
EDS yes yes yes (yes)
BSE yes yes yes yes
OIM yes – – –
WDS – – yes yes
Spectrometer – – 2 5
Crystals – – LIF, PET, TAP
STE		 LIF, PET, TAP
PC0, PC1, PC2, PC3
Large Crystals – – – LLIF, LPET
LPC1, LPC2
Anticontamination
equipment		 – – – air jet,
cooling plate
Pump system (EPMA) – – turbo pump turbo pump,
oil free primary pump


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