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Research Acitivities |
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Development and Relaxation of Residual Stresses in Thin Films
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The properties of thin (PVD) layers can depend strongly on residual stresses formed during the growth or the cooling process after deposition. These stresses are evaluated using the methods of diffraction stress analysis. Interrelations between residual stresses and the film production parameters, the microstructure and the texture are studied systematically.
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