|
|
|
 |
|
|
| Research Acitivities |
|
|
|
|
Diffusion in Thin Layer Systems
|
|
Diffusion processes and reactions in thin multilayers play an important role in technological applications. By X-ray reflectometry concentration profiles on a nanometer scale can be determined. Current research activities involve the evaluation of measured data by fitting with simulation routines.
Reflectivity of a 50nm thick sputtered Ge layer on a Si (100) wafer. A concentration profile at the Ge-Si interface after annealing at 900°C causes a damping of the oscillations.
|
|
|
Top