STARTSEITE
Zurück zur Startseite
Luftbild_Institut
mainpicNavi
Forschung
Veröffentlichungen
Institut
Aktuelles & News
Service
[Intranet]
X-ray Diffraction
Research Acitivities
Stressed Thin Films
Research Acitivities
  Stressed Thin Films     Grain Interaction     Diffusion and Reactions     Deformed Metals     Method Development  


Development and Relaxation of Residual Stresses in Thin Films

The properties of thin (PVD) layers can depend strongly on residual stresses formed during the growth or the cooling process after deposition. These stresses are evaluated using the methods of diffraction stress analysis. Interrelations between residual stresses and the film production parameters, the microstructure and the texture are studied systematically.


drucken Druckversion topPfeil  Top
© 2012, Max-Planck-Institut für Metallforschung, Stuttgart